SÜSS MicroTec ist einer der weltweit führenden Hersteller von Anlagen- und Prozesslösungen für die Mikrostrukturierung in der Halbleiterindustrie und . Weiteres Bild melden Melde das anstößige Bild. Use: -High resolution photolithography. Vermont, USA, Contact Information:. CAUTION: During Exposure – DO NOT STARE .

UV Exposure: The high energy light produced by the high pressure. Location: Nanofab, Building 21 Room. The mask aligner is used in photolithography to transfer features.

Equipment Training Training is scheduled on an as-needed need basis. STANDARD OPERATING PROCEDURE. Purpose of this Instrument: This instrument is for patterning photosensitive . For training contact the MFC Engineer in office 201E,.

A Intelligent exposure control unit monitors lamp intensity and life time.

SUSS PM Manual Probe System. Standard Operating Procedure. These instructions are intended for reference only, and will not replace.

Mask aligners are used in photolithographic processes to transfer a pattern from a mask to a photoresist coating on the substrate. High Resolution Photolithography in a vacuum-contact mode. The MAUV optics allows full field exposure of a whole wafer and optimized for steep wall slopes and high resolution. Transducer: Wavelength 405NM, Art: . Suss Drive Waterbury Center, Vt.

UV 3Optics for 365nm photoresists. Samples of all shapes from 4mm square up to diamater. PLEASE CONTACT US IF YOU HAVE SYSTEMS TO SELL. Author: Checked By: Karl Süss Mask Aligner.

Resonator edge motion is measured with a LDV and . It offers flexibility in the handling of irregularly . Viele übersetzte Beispielsätze mit suss – Deutsch-Englisch Wörterbuch und Suchmaschine für Millionen von.